You are in:Home/Publications/“A new approach for numerical simulation of quantum transport in double-gate SOI,” International Journal of Numerical Modelling: Electronic Networks, Devices and Fields, , Vol. 20, Issue 6, pp. 299-309.Available online at http://www3.interscience.wiley.com/

Prof. Tarek Mohammad Abdolkader Hasan :: Publications:

Title:
“A new approach for numerical simulation of quantum transport in double-gate SOI,” International Journal of Numerical Modelling: Electronic Networks, Devices and Fields, , Vol. 20, Issue 6, pp. 299-309.Available online at http://www3.interscience.wiley.com/
Authors: T. M. Abdolkader
Year: 2007
Keywords: Not Available
Journal: International Journal of Numerical Modelling-Electronic Networks Devices and Fields
Volume: 20
Issue: 6
Pages: 299-309
Publisher: Wiley
Local/International: International
Paper Link: Not Available
Full paper Tarek Mohammad Abdolkader Hasan_Abdolkader-2007-A new approach for n.pdf
Supplementary materials Not Available
Abstract:

Numerical simulation of nanoscale double-gate Sol (Silicon-on-Insulator) greatly depends on the accurate representation of quantum mechanical effects. These effects include, mainly, the quantum confinement of carriers by gate-oxides in the direction normal to the interfaces, and the quantum transport of carriers along the channel. In a previous work, the use of transfer matrix method (TMM) was proposed for the simulation of the first effect. In this work, TMM is proposed to be used for the solution of Schrodinger equation with open boundary conditions to simulate the second quantum-mechanical effect. Transport properties such as transmission probability, carrier concentration, and I-V characteristics resulting from quantum transport simulation using TMM are compared with that using the traditional tight-binding model (TBM). Comparison showed that, when the same mesh size is used in both methods, TMM gives more accurate results than TBM.

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